Description

The PV-360 is a high-volume, in-line spray doping system for the thin and uniform application of phosphoric and boric acid based dopants to crystalline photovoltaic cells for the in-line thermal diffusion and laser doped selective emitter processes. Now in its 3rd generation, the PV-360 leverages USI’s proprietary nozzle-less ultra-Thin Coating Application Technology (tCAT) for a more uniform, thinner coating compared to conventional nozzle based spray, roll coating or fog coating technologies.

Features and benefits:

  • Proprietary, nozzle-less ultra-Thin Coating Application Technology (tCAT)
  • Typical coatings applied include:
    • Phosphoric acid based dopants
    • Boric acid based dopants
    • Compatible with water based and solvent based dopants
  • Non-contact coating application with excellent coating transfer efficiency – up to 99%
  • Process width: 914mm (36 inches)
  • Compatible with any in-line thermal diffusion furnace
  • Long-life, high speed traversing mechanism with servo motor drive
  • Constructed with materials compatible with acidic and caustic coating liquids
  • Isolated and ventilated spray area
  • PAC controller with touchscreen HMI
  • PMP-200 Precision Metering Pump liquid delivery system, features:
    • Servo drive positive displacement liquid metering pump
    • Dual pump design for uninterrupted operation
    • Automatic pump refill from on-board PFA coating reservoir
    • Data logging
  • Conveyor system:
    • Teflon coated Kevlar mesh belt
    • Up to 1.8 meters/minute (5.9 feet/minute) speed
    • Accommodates up to six (6) rows of 125mm (5 inch) wafers
    • Integrated water-based conveyor belt cleaning and drying system
    • Water-based conveyor belt cleaning system
  • Optional wafer drying system